MP51 - Microgravity-induced wet chemical etching of borosilicate glass – towards enhanced microfabrication methods
- Event
- EUROSENSORS XXXVII
2025-09-07 - 2025-09-10
Wroclaw - Band
- Poster I
- Chapter
- Microfluidics
- Author(s)
- K. Baranowski, M. Białas, A. Krakos - Wroclaw University of Science and Technology, Wrocław (Poland)
- Pages
- 305 - 306
- DOI
- 10.5162/EUROSENSORS2025/MP51
- ISBN
- 978-3-910600-07-2
- Price
- free
Abstract
This study investigates the impact of simulated microgravity on wet chemical etching of borosilicate glass to identify the potential microfabrication efficiency. For the first time, straight microchannels were etched in HF-based solutions using microgravity simulators (RWV, RPM). In result, with RPM the highest etching rate could be achieved (3.06 µm/min), showcasing a novel approach to chemical processing. Moreover, the structures formed under microgravity were found to be of high-quality—RPM gave the deepest, and most uniform channels, while RWV ensured the best reproducibility. These findings offer a strong basis for further research in microgravity conditions, especially in the context of reaction kinet-ics.