C2.3 - A monolithic integrated MEMS in a 350 nm technology for filter monitoring applications
- Event
- AMA Conferences 2013
2013-05-14 - 2013-05-16
Nürnberg - Band
- Proceedings SENSOR 2013
- Chapter
- C2 - Sensor Electronics II
- Author(s)
- S. Heinz, K. Erler, J. Horstmann - Chemnitz University of Technology (Germany), M. Neubert, R. Seidel, A. Pohle - EDC Electronic Design Chemnitz GmbH (Germany), C. Gross, A. Rönisch, P. Gabriel - TURCK duotec GmbH (Germany)
- Pages
- 368 - 372
- DOI
- 10.5162/sensor2013/C2.3
- ISBN
- 978-3-9813484-3-9
- Price
- free
Abstract
This paper presents a system which combines a modern 350 nm mixed-signal CMOS technology with a MEMS technology for monitoring of the filter contamination level of suction and filtering systems. Therefore the system includes a piezoresistive pressure sensor, a controller core, a power management, a digital and analog signal processing with a variable gain up to 270 and an 8 bit autonomous offset adjust as well as a RFID interface to allow wireless transfer of energy and data.