3.1.1 - Reference nanometrology based on AFM, SEM and TEM techniques
- 18. GMA/ITG-Fachtagung Sensoren und Messsysteme 2016
2016-05-10 - 2016-05-11
- 3.1 Mikro- und Nanomesssysteme
- G. Dai, W. Häßler-Grohne, J. Fluegge, H. Bosse - Physikalisch-Technische Bundesanstalt, Braunschweig (Germany)
- 148 - 155
Highly accurate dimensional metrology of nano structures are increasingly demanded for quality assurance in various nanomanufacturing industries. This paper presents some recent progresses on the developments of reference nanometrology at PTB based on AFM, SEM and TEM techniques: (i) the enhancement of the measurement speed of PTB’s Met. LR-AFM up to 1 mm/s (i.e. 50x faster than before), thus significantly increase its measurement throughput and reduced the measurement drift; (2) the development of the 3D/CD-AFM, which is capable of true 3D measurements of nanostructures either with flared AFM tips or in the tilting-AFM principle; (3) the realisation of a new bottom-up traceability approach which applies the 28 Si crystal lattice as internal “rulers” based on TEM; (4) CDSEM metrology with developed simulation software, a modular Monte Carlo software package MCSEM, for the simulation of electron signal contrast; and (5) the development of a new CD reference material referred as IVPS100-PTB.