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W8.1.2 - Optical Response to Hydrogen of WO3 Thin Films Pre-pared by Magnetron Sputtering

Event
EUROSENSORS XXXVII
2025-09-07 - 2025-09-10
Wroclaw
Band
Lectures
Chapter
W8.1 - Gas Sensors 6
Author(s)
W. Weichbrodt, J. Domaradzki, M. Mazur - Wroclaw University of Science and Technology, Wroclaw (Poland)
Pages
191 - 192
DOI
10.5162/EUROSENSORS2025/W8.1.2
ISBN
978-3-910600-07-2
Price
free

Abstract

Tungsten oxide thin films were prepared using gas impulse magnetron sputtering and as-deposited samples were additionally annealed at 400°C to obtain nanocrystalline structure. Surface studies re-vealed good homogeneity of the prepared coatings. Thin films were exposed to hydrogen with different concentrations and their optical response, that is the decrease of transmission coefficient, was meas-ured in the spectral range from 200 to 10⁰⁰ nm. The change of resistance upon exposure to hydrogen,was also measured to compare optical and electrical reponse.

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