5.2.4 - All-Dry Dual-Stencil Lithography for IGZO Thin-Film Transducers
- Event
- EUROSENSORS 2026
2026-09-06 - 2026-09-09
Zurich - Band
- Lectures
- Chapter
- Emerging Sensor Materials
- Author(s)
- C. Zhang, G. Boero, J. Brugger - École Polytechnique Fédérale de Lausanne (EPFL),Lausanne (Switzerland)
- Pages
- 173 - 174
- DOI
- 10.5162/eurosensors2026/5.2.4
- ISBN
- 978-3-910600-12-6
- Price
- free
Abstract
Amorphous indium-gallium-zinc oxide (IGZO) is attractive for active thin-film transducer stacks processed at near-room temperature. Here, dual stencil lithography with alignment was used to fabricate an IGZO thin-film-transistor (TFT) stack, without photoresist or wet etching, with a maximum process temperature of 150 °