P2.0.19 Synthesis of tin dioxide thin films with different morphology by APCVD for gas sensor application
- 14th International Meeting on Chemical Sensors - IMCS 2012
2012-05-20 - 2012-05-23
- P2.0 Metal Oxide-based Sensors
- V. Popov, V. Sevastynov, N. Kuznetsov - Kurnakov Institute of General and Inorganic Chemistry of the Russian Academy of Sciences (Russia)
- 1322 - 1323
Tin dioxide thin films with different morphology were obtained by atmospheric pressure chemical vapor deposition (APCVD) on silicon and alumina substrates. As a precursor used volatile tin compounds with crown ethers: [Sn(H2O)2Cl4]•(18-_r-6), [Sn(18-_r-6)Cl4]. The composition and morphology of coatings obtained were studied by atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray diffraction (XRD), Energy-Dispersive X-ray Spectrometry (EDX). The measurements of the resistance of coatings in different atmosphere were obtained.