D6.1 - High Throughput Magnetron Sputtering of Tilted c-Axis AlN Films for Biosensing Applications
- Event
- SMSI 2025
2025-05-06 - 2025-05-08
Nürnberg - Band
- Lectures
- Chapter
- D6 - Piezoelectric MEMS II
- Author(s)
- P. Bergmann, E. Loos, M. Nestler - scia Systems GmbH, Chemnitz (Germany)
- Pages
- 220 - 221
- DOI
- 10.5162/SMSI2025/D6.1
- ISBN
- 978-3-910600-06-5
- Price
- free
Abstract
A new two-step approach for high throughput magnetron sputtering of tilted c-axis aluminum nitride will be presented. This includes a slower growth of AlN in a tilted magnetron arrangement followed by a faster AlN deposition in a standard face-to-face sputtering arrangement.